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Chemical-Mechanical Polishing - Fundamentals and Challenges (English, S. V. Babu) - Image 1 - BookBajar

Chemical-Mechanical Polishing - Fundamentals and Challenges (English, S. V. Babu)

by S. V. Babu

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Chemical-Mechanical Polishing - Fundamentals and Challenges by S. V. Babu is listed under Engineering on BookBajar. Full details, specifications and reader reviews are below.

Book Details

Publisher
Cambridge University Press
Language
English
ISBN-13
9781558994737
ISBN-10
1558994734
Author
S. V. Babu

About the Book

Chemical-mechanical planarization (CMP) has emerged over the past few years as a key enabling technology in the relentless drive of the semiconductor industry towards smaller, faster and less expensive interconnects. However, there are still many gaps in the fundamental understanding of the overall CMP process and the associated defect and contamination issues. This book brings together many of the active players in the field to focus on the inte…

ISBN: 9781558994737

ISBN-13: 9781558994737
ISBN-10: 1558994734

Reader's Guide

What This Book Covers

  • ·Core technical concepts referenced throughout Chemical-Mechanical Polishing - Fundamentals and Challenges
  • ·Worked examples and applied problem-solving
  • ·Terminology and standards relevant to the field

Best Suited For

Engineering students, working engineers, and technical researchers.

Why It Stands Out

  • ·Ships as a genuine physical copy, checked before dispatch
  • ·Covered by BookBajar's 15-day return window

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What is the price of Chemical-Mechanical Polishing - Fundamentals and Challenges?
Chemical-Mechanical Polishing - Fundamentals and Challenges starts from ₹3973 at BookBajar. Available in Paperback.
Who is the author of Chemical-Mechanical Polishing - Fundamentals and Challenges?
S. V. Babu is the author of Chemical-Mechanical Polishing - Fundamentals and Challenges. Browse more books by S. V. Babu on BookBajar.
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What is the ISBN of Chemical-Mechanical Polishing - Fundamentals and Challenges?
Chemical-Mechanical Polishing - Fundamentals and Challenges has ISBN 9781558994737 (ISBN-10: 1558994734). Use this to confirm you're ordering the exact edition listed here.
What can I expect from Chemical-Mechanical Polishing - Fundamentals and Challenges?
About the Book Chemical-mechanical planarization (CMP) has emerged over the past few years as a key enabling technology in the relentless drive of the semiconductor industry towards smaller, faster and less expensive interconnects.
ISBN-10: 1558994734. ISBN-13: 9781558994737. Chemical-Mechanical Polishing - Fundamentals and Challenges (English, S. V. Babu) by S. V. Babu. Available on BookBajar.
Product ID: isbn-9781558994737